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The Triple‑Target Magnetron Sputtering System delivers stable, high‑precision thin‑film deposition for both research and industrial applications. It supports multiple materials, ensures excellent film uniformity, and offers flexible process control for advanced coating development.
Technical Parameters
The Triple‑Target Magnetron Sputtering System delivers stable, high‑precision thin‑film deposition for both research and industrial applications. It supports multiple materials, ensures excellent film uniformity, and offers flexible process control for advanced coating development.
Technical Parameters:
| No. | Parameter | Specification |
| 1 | Model | KS-PVD-MS450 |
| 2 | System Type | High vacuum multi-cathode magnetron sputtering system |
| 3 | Loading Method | Manual substrate loading |
| 4 | Base Pressure (Ultimate Vacuum) | ≤ 5 × 10⁻⁷ mbar |
| 5 | Working Pressure Range | 1 – 5 mTorr |
| 6 | Pressure Control | Automatic pressure control |
| 7 | Vacuum Measurement | Full range vacuum gauges |
| 8 | Turbo Molecular Pump Speed | 1200 L/s |
| 9 | Dry Backing Pump Speed | 4 L/s (≈14.4 m³/h) |
| 10 | Number of Magnetron Cathodes | 3 pcs |
| 11 | Cathode Mounting | Top-mounted |
| 12 | Target Size | 2 inch diameter |
| 13 | Target Cooling | Direct water cooling |
| 14 | Source Shutters | One shutter for each cathode |
| 15 | Cathode–Substrate Distance | Adjustable, 5 – 10 cm |
| 16 | DC Power Supplies | 2 units |
| 17 | DC Power Range | 0 – 600 W |
| 18 | RF Power Supply | 1 unit |
| 19 | RF Power Specification | 13.56 MHz, ≥ 600 W |
| 20 | Compatible Deposition Materials | Ti / Pt / Au, AuGe / Ni / Au |
| 21 | Process Gas | Argon (Ar), 99.999% purity |
| 22 | Gas Flow Control | Mass Flow Controller (MFC) |
| 23 | Reactive Gases | N₂ / O₂ (optional) |
| 24 | Thickness Monitoring | In-situ Quartz Crystal Monitor (QCM) |
| 25 | Quartz Crystals | 2 pcs |
| 26 | Substrate Size | Up to 3 inch wafers |
| 27 | Substrate Heating Temperature | Up to 500 °C |
| 28 | Substrate Rotation Speed | 0 – 20 rpm |
| 29 | Film Thickness Uniformity | ≤ 3% within effective 3-inch area |
| 30 | Control System | PC / PLC control |
| 31 | Software Platform | Compatible with Windows 10 |
| 32 | Power Requirement | 220 – 240 VAC, 50 Hz |