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PVD Coating Machine

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Ultrahigh Vacuum Field Emission Facility

Used area: Field emission detection for nanostructures and other materials.


Technical Parameters

Specifications:

Ultimate vacuum 5×10-7Pa, size of spherical chamber Ø300, sample size Ø10, sample temperature up to 500°C.


Description:

The open voltage, threshold voltage, and field emission stability can be analyzed with this facility.