Home - Products - PVD Coating Machine - Four-source organic-inorganic combined evaporation coating equipment
The four-source organic-inorganic combined evaporation coating equipment is suitable for the preparation of metal element films, semiconductor films, oxide films, organic films, etc. It can be used in scientific research units to conduct research on new materials and new process films, and can also be used for mass production.
Technical Parameters
Product introduction:
The four-source organic-inorganic combined evaporation coating equipment is suitable for the preparation of metal element films, semiconductor films, oxide films, organic films, etc. It can be used in scientific research units to conduct research on new materials and new process films, and can also be used for mass production. . The user groups of OPV series vacuum evaporation coating and glove box combined system are scientific research institutes and laboratories. The vacuum evaporation system studio is placed in the ultra-pure environment of Glove box without water, oxygen and dust. Seamless docking, integration of control and integration, are widely used in organic, inorganic, perovskite thin film solar cells, OLED and other research fields.
Main feature:
1. The sample has a baking heating function during the coating process. The maximum baking heating temperature is: room temperature ~ 180 ℃, temperature measurement and temperature control.
2. The equipment is equipped with a water-cut and power-off chain protection alarm device and an anti-misoperation protection alarm device.
Technical parameter:
| Model | KS-EVP-4S |
| Coating chamber | The size of the coating chamber is about 600×450×450mm, stainless steel material, square front and rear door structure, with anti-fouling plate inside. |
| Pumping system | using molecular pump + mechanical pump pumping system |
| Vacuum degree | the ultimate vacuum of the coating chamber is less than or equal to 6×10-4Pa; |
| System leak rate | ≤1×10-7PaL/s. |
| Evaporation source system | 4 organic source evaporation sources, volume 5ml, 2 evaporation power sources, temperature measurement and temperature control, heating temperature 400 ℃, power 0.5Kw; |
| Baffle | The evaporation source baffle adopts automatic magnetic control method to control its opening; |
| Installation | The evaporation source is installed on the lower bottom of the vacuum chamber. |
| Sample rack system | The sample holder can hold samples with a size of Φ120mm and glass slides; |
| The sample holder can be rotated, and the rotation speed is 0 to 30 rpm; | |
| Installation | The sample is installed on the upper cover of the vacuum chamber, the evaporation source is installed on the lower cover of the vacuum chamber, and the coating is evaporated upward. The evaporation sources are equipped with baffle devices. |
| Packing list | 2 sets of inorganic evaporation sources, volume 5ml, 2 sets of evaporation power sources, heating current 300A, power 3.2Kw; |
| Quartz crystal film thickness controller | the film thickness measurement range is 0-999999Å. |
