Home - Products - PVD Coating Machine - High Vacuum Dual-Source DC/RF Magnetron Sputtering Coater with 2" Targets
The KS-PVD-3HD-LD is a compact magnetron sputtering system designed for thin film deposition and materials research. The system is equipped with dual 2-inch magnetron sputtering sources, allowing flexible configuration with DC and RF power supplies to meet different coating requirements.
Technical Parameters
Product Description:
The KS-PVD-3HD-LD is a compact magnetron
sputtering system designed for thin film deposition and materials research. The
system is equipped with dual 2-inch magnetron sputtering sources, allowing
flexible configuration with DC and RF power supplies to meet different coating
requirements.
One sputtering source can be configured
with a DC power supply for efficient deposition of metallic films, while the
other source can be equipped with an RF power supply for coating non-conductive
materials. This flexible design enables the system to perform co-sputtering
processes as well as multi-layer thin film deposition, making it suitable for
advanced research and development applications.
The system supports a wide range of
coating materials, including alloys, ferroelectric materials, semiconductors,
ceramics, and dielectric films. With precise process control and a compact
footprint, the KS-PVD-3HD-LD is well suited for laboratory-scale thin film
research, materials development, and functional coating studies.
Technical parameters:
| Item | Specification |
| Model | KS-PVD-3HD-LD |
| Input Power | 220 VAC, 50/60 Hz, single phase |
| Total Power Consumption | 2000 W (including vacuum pump) |
| Power Source Options | Optional: single DC power source, single RF power source, or DC + RF power sources |
| DC Power Source | 500 W, for coating metallic materials |
| RF Power Source | Compact 300 RF power source, for non-conductive materials |
| Magnetron Sputtering Heads | Three 2" magnetron sputtering heads included |
| Magnetron Head Cooling | Water-cooled jackets |
| Head Water Cooling Requirement | 10 ml/min water flow per head |
| Vacuum Chamber Size | Ø300 mm × 300 mm (H) |
| Vacuum Chamber Material | Stainless steel |
| Observation Window | Ø100 mm |
| Chamber Cover | Hinged top cover with air spring support for easy target exchange |
| Sample Holder Size | Ø140 mm, supports up to 4" wafer |
| Sample Holder Rotation Speed | Adjustable, 1–20 rpm |
| Sample Holder Temperature Range | Room temperature to 500 °C |
| Temperature Control Accuracy | ±1.0 °C |
| Gas Flow Control | Two precision digital mass flow controllers (MFC) |
| Gas Types | Supports two different gases |
| Maximum Gas Flow Rate | 200 ml/min |
| Gas Flow Control Interface | Adjustable via 6" touch screen control panel |
| Turbo Molecular Pump | High-speed turbo pump, made in Germany, directly mounted on chamber |
| Backing Pump | Heavy-duty dual-stage mechanical pump |
| Pump Station | Mobile pump station included |
| Maximum Vacuum Level | 10⁻⁶ Torr (with chamber baking) |
| Overall Dimensions | L1300 × W660 × H1200 mm |
| Net Weight | 160 kg |
| Warranty | 2 years limited warranty with lifetime technical support |
