Arc ion plating is one of the PVD technologies. It is capable to apply metals and alloy coatings onto substrates after pretreatment. Arc ion plating make efficient deposition. The coatings made by this technology is durable and hard.
Technical Parameters
General Description:
Arc ion plating is one of the PVD technologies. It is capable to apply metals and alloy coatings onto substrates after pretreatment. Arc ion plating make efficient deposition. The coatings made by this technology is durable and hard. It can be used for both of decorative and functional applications. The process produces a lot of heat from arc ion cathodes. So it is suitable for the materials which can bear high temperature up to several hundred centigrade.
Technical Parameters:
| Item | Parameter |
| Model | KS-PVD-ARC650 |
| System Type | Hybrid PVD Arc Deposition & Magnetron Sputtering Coating System |
| Vacuum Chamber Structure | Vertical, single chamber, stainless steel with double-layer water cooling jacket |
| Vacuum Chamber Inner Size | Diameter 650 mm × Height 650 mm |
| Chamber Material | Stainless Steel 304, inner surface polished |
| Observation Port | Optical observation window on chamber door |
| Ultimate Vacuum Pressure | ≤ 1.0 × 10⁻⁴ Pa |
| Pump-down Time | ≤ 30 min from atmosphere to 5.0 × 10⁻³ Pa |
| Working Heating Temperature | ≤ 500 °C (≥ 450 °C required) |
| Temperature Control Accuracy | ± 5 °C |
| Heating Method | Resistance heaters installed on chamber wall and center |
| Arc Evaporation Sources | 3 sets cathodic arc sources, DC working mode |
| Arc Power Supply | 10 kW arc power supply for each arc source |
| TiN Deposition Rate (Arc Mode) | ≥ 5 μm/h |
| Magnetron Sputtering Source | MF planar magnetron sputtering cathode, water cooled |
| Magnetron Deposition Rate (TiN) | ≥ 2 μm/h |
| Ion Source | Low-energy ion source, 10 kW |
| Substrate Rotation | Planetary rotation system, dual planetary structure |
| Number of Planets | ≥ 6 planetary holders |
| Max. Substrate Load | ≥ 120 kg |
| Film Thickness Uniformity | ≤ 5 % |
| Average Noise Level | ≤ 75 dBA |
| Mean Time Between Failures (MTBF) | ≥ 1000 h |
| Vacuum Pump System | Mechanical pump + dry screw pump + turbo molecular pump |
| Gas Supply System | Mass Flow Controllers (MFC), automatic gas mixing |
| Applicable Gases | Ar, N₂, O₂, C₂H₂, etc. |
| Control System | PLC control system with 15-inch touch screen |
| Installed Power | About 105 kW |
| Average Power Consumption | About 50 kWh |
| Cooling System | Closed-loop water chiller system |
| Compressed Air Requirement | 0.5 – 0.6 MPa |
| Machine Dimensions (L×W×H) | Approx. 2.3 × 1.6 × 1.95 m |
| Machine Weight | Approx. 1550 kg |
| Warranty | 12 months |
