Laboratory Dip Coating/coater System with Micron-Grade Film Control and Speed Variation

Product description.

The KS-PVD-DP01 Dip Coating Machine is a precision instrument developed for the research and production of thin films on glass substrates and silicon wafers, particularly for applications involving the growth of nanometer-scale coatings from liquid-phase materials. It is a product and an essential piece of equipment for institutions engaged in research on liquid-phase film formation. This machine is widely adopted by research institutes, laboratories, and universities due to its reliability, precision, and ease of use.

The KS-PVD-DP01 system integrates a high-precision stepper motor drive with a motion control system independently developed by our team, enabling consistent and stable lifting operations. The direction of movement can be conveniently switched via a manual toggle button, allowing users to control upward and downward motion based on their coating needs. The lifting speed and stroke can be adjusted with high precision, ensuring accurate positioning and uniform coating thickness during both immersion and withdrawal phases.

The machine operates by immersing a sample substrate into a solution containing the desired coating material. A smooth and consistent lifting motion ensures that the substrate is evenly coated with a uniform thin film as it is withdrawn from the solution. The KS-PVD-DP01 also allows manual control of immersion and withdrawal through a conveniently positioned control panel. This flexibility is particularly useful during the optimization phase of coating experiments, where repeatability and real-time feedback are critical.

For ease of use, the device features a touch-screen interface and clearly marked operation buttons. It is designed for room-temperature operation and can be placed directly on a benchtop. For users who require dip-coating under controlled temperature conditions, the KS-PVD-DP01 can be paired with an optional temperature-controlled oven or vacuum chamber for advanced experimental setups.

The KS-PVD-DP01 offers excellent film uniformity by leveraging a silk-smooth motorized lift to maintain constant speed, which minimizes turbulence and solution instability. The result is a high-quality thin film with consistent thickness across the entire surface. By adjusting the immersion depth, lifting speed, and withdrawal speed, researchers can customize the film thickness to meet various experimental requirements.

The equipment is compact and space-saving, making it ideal for small and medium-sized laboratories. Its user-friendly design ensures that both beginners and experienced researchers can quickly master its operation. The modular construction allows for easy maintenance and component replacement, enhancing the system’s longevity and versatility.

Key advantages of the KS-PVD-DP01 Dip Coating Machine include:

• Compact and simple     design: The system is easy to set up, operate, and relocate, making it     suitable for both entry-level and advanced users.
• Efficient and     space-saving: Its streamlined design minimizes space requirements while     maintaining full functionality.
• Precision motion control:     A high-precision stepper motor provides accurate and vibration-free linear     motion during the dip-coating process.
• Flexible operation:     Users can choose between automatic and manual modes, allowing fine control     during development or testing phases.
• Wide range of     applications: Ideal for research on photoresist coatings, sol-gel     processes, nanoparticle films, conductive layers, and organic/inorganic     hybrid materials.

In conclusion, the KS-PVD-DP01 is a versatile and cost-effective solution for laboratories focused on thin film deposition, material development, and coating research. With its high performance, reliability, and intuitive operation, it has become a standard tool in the fields of materials science, chemistry, nanotechnology, and optoelectronics.

Technical parameters.