Home - Products - PVD Coating Machine - Flame Assisted Spray Pyrolysis coating System for Perovskite Solar Cell Deposition
KS‑PVD‑FSP04 Flame Assisted Spray Pyrolysis System is an advanced laboratory coating solution engineered for precise and uniform thin film deposition. This system employs flame‑assisted spray pyrolysis technology to atomize precursor solutions into fine droplets and transfer them through an oxygen‑propane flame onto heated substrates.
Technical Parameters
Product Description:
KS‑PVD‑FSP04 Flame Assisted Spray Pyrolysis System is an advanced laboratory coating solution engineered for precise and uniform thin film deposition. This system employs flame‑assisted spray pyrolysis technology to atomize precursor solutions into fine droplets and transfer them through an oxygen‑propane flame onto heated substrates. Thermal decomposition of the droplets forms high‑quality functional coatings on a wide range of materials.
Designed for research, development, and pilot production environments, the KS‑PVD‑FSP04 delivers stable flame heating, accurate solution control, and programmable X‑Y stage motion to achieve consistent coating uniformity and repeatability. The user‑friendly PC‑based software enables automated process control, flexible parameter adjustment, and recipe storage for repeated runs.
This system is widely used for:
Deposition of metal oxide films such as ZnO, Al₂O₃, ZrO₂, MgO
Transparent conductive coatings including ITO & FTO
Perovskite solar cell layer deposition
Functional nanomaterials for sensors, energy and catalysis
Fuel cell materials and ceramic coatings
With optional enhancements like rotating substrate stage, mass flow controllers, ultrasonic atomizing nozzle, or multi‑nozzle configurations, the KS‑PVD‑FSP04 can be tailored for specialized research and production requirements.
Technical parameters:
| Item | Parameter |
| Model | KS‑PVD‑FSP04 |
| Equipment Name | Flame Assisted Spray Pyrolysis Coating System |
| Input Power | AC 208–240V, Single Phase |
| Total Power | 3–5 kW |
| Control Method | PC Software Control |
| Communication Port | RS232 |
| Syringe Pump Type | Stepper Motor Driven |
| Dispensing Rate | 1–20 ml/min |
| Syringe Capacity | 50 ml / 250 ml |
| Spray Nozzle Type | Compressed Air Atomizing Nozzle |
| Carrier Gas | Compressed Air |
| Spray Movement | X‑Y Automatic Moving Stage |
| X Axis Travel | Max 200 mm |
| Y Axis Travel | Max 200 mm |
| X Axis Speed | 5–20 mm/s |
| Y Axis Speed | 2–12 mm/s |
| Heating Plate Size | 175 × 175 mm |
| Max Heating Temperature | 500°C |
| Temperature Control Accuracy | ±1°C |
| Flame Type | O₂ + LPG Flame |
| LPG Flow Meter Range | 0–2 L/min |
| Oxygen Flow Meter Range | 0–25 L/min |
| Gas Control | Manual Flow Meter |
| Cooling Method | Water Cooling |
| Cooling Water Temperature | < 25°C |
| Cooling Water Pressure | ~20 PSI |
| Cooling Water Pipe | 6 mm Outer Diameter |
| Software Control | Syringe Pump + XY Stage |
| Process Data Storage | Yes |
| Machine Dimension | Approx. 1400 × 1100 × 1700 mm |
| Shipping Size | 1423 × 1143 × 1778 mm |
| Shipping Weight | Approx. 450 kg |
| Application | Thin Film Deposition / Spray Pyrolysis |
| Deposition Materials | ZnO, Al₂O₃, ZrO₂, MgO, ITO, FTO, Perovskite |
| Optional Function | Rotating Substrate Stage |
| Optional Function | Mass Flow Controller |
| Optional Function | Ultrasonic Spray Nozzle |
| Optional Function | Multi‑Nozzle System |
