Home - Products - PVD Coating Machine - Single Target Magnetron Sputtering System for SEM Thin Film Coating
The KS-PVD-MS180 is a compact high-vacuum magnetron sputtering system designed for thin film deposition and sample coating. It is suitable for SEM sample preparation and coating of metals, ceramics, semiconductors, dielectric materials and other research samples.
Technical Parameters
The KS-PVD-MS180 is a compact high-vacuum magnetron sputtering system designed for thin film deposition and sample coating. It is suitable for SEM sample preparation and coating of metals, ceramics, semiconductors, dielectric materials and other research samples. The system features a 2-inch magnetron sputtering gun, DC sputtering power supply, substrate heating and rotation, film thickness monitoring, mass flow control, and touchscreen PLC control.
Technical Parameters:
| Parameter | Specification |
|---|---|
| Product Name | High Vacuum Magnetron Sputtering Coater |
| Model | KS-PVD-MS180 |
| Vacuum Chamber | Ø180 × 200 mm, 304 stainless steel |
| Substrate Size | Ø100 mm |
| Substrate Rotation | 0–20 rpm, adjustable |
| Max. Heating Temperature | 300°C |
| Vacuum Pump | DVR10 |
| Pumping Speed | 9.9 L/s |
| Ultimate Vacuum | ≤0.5 Pa |
| Magnetron Sputtering Gun | 1 × 2-inch |
| Target Angle | ±45°, adjustable |
| Target Shutter | Pneumatic shutter |
| DC Sputtering Power Supply | 500 W |
| Gas Flow Control | Ar, 0–200 sccm MFC |
| Film Thickness Monitoring | Quartz crystal thickness monitor |
| Control System | Touchscreen + PLC automatic control |
| Water Chiller | CW-3000, 30 W pump, 13 L/min |
| Overall Dimensions | L510 × W420 × H650 mm |
| Total Power | Approx. 2.5 kW |
