4-Inch Spin Coater for Photoresist Coating and Lithography Processes

The KS-SP-PM4 is a precision laboratory spin coater designed for uniform thin film deposition on small substrates, featuring a transparent 4-inch acrylic chamber that allows full visibility of the coating process. Engineered for research and development applications, this compact benchtop system delivers highly reproducible results for photoresist coating, polymer films, perovskite layers, and nanomaterial thin films.

With a programmable digital interface, the KS-SP-PM4 enables customizable spin profiles including variable speed ramps and acceleration control, ensuring optimal film thickness and uniformity. Its high-quality acrylic chamber not only provides a safe, clean environment for coating but also allows real-time observation of the substrate, enhancing experiment accuracy.

Ideal for semiconductor labs, MEMS fabrication, materials science, and energy materials research, the KS-SP-PM4 combines precision, reliability, and user-friendly operation. Its durable construction, smooth motor performance, and compact footprint make it a versatile tool for academic and industrial laboratories alike.

Key Features:

Transparent 4-inch acrylic chamber for clear process visibility

Programmable spin profiles with speed and acceleration control

Uniform thin film deposition for photoresist, polymers, and nanomaterials

Compact benchtop design suitable for research labs

High reproducibility and reliable operation for academic and industrial use

Technical Parameters：