Home - Products - CVD Coating Machine - 300mm Roll-to-Roll PECVD System for Continuous Thin Film Deposition
The KS-RPECVD-300 High Vacuum Roll-to-Roll PECVD System is a continuous plasma-enhanced chemical vapor deposition (PECVD) platform designed for high-quality thin film coating on flexible substrates. Featuring a 300 mm diameter high-purity quartz tube and an integrated roll-to-roll transport mechanism, the system enables continuous substrate movement under a stable vacuum environment, making it ideal for both laboratory research and pilot-scale production.
Technical Parameters
The KS-RPECVD-300 High Vacuum Roll-to-Roll PECVD System is a continuous plasma-enhanced chemical vapor deposition (PECVD) platform designed for high-quality thin film coating on flexible substrates. Featuring a 300 mm diameter high-purity quartz tube and an integrated roll-to-roll transport mechanism, the system enables continuous substrate movement under a stable vacuum environment, making it ideal for both laboratory research and pilot-scale production.
The system combines a high-temperature tube furnace, RF plasma source, precision gas flow control, automatic winding and unwinding mechanism, and a high-vacuum pumping system to provide excellent film uniformity, repeatability, and process stability. The adjustable substrate transport speed allows precise control of coating thickness and deposition time, while the PLC touch-screen control system ensures convenient operation and reliable process management.
This equipment is suitable for depositing a wide range of functional thin films, including SiOx, SiNx, amorphous silicon (a-Si), polycrystalline silicon, carbon-based films, graphene-related coatings, dielectric layers, and other advanced functional materials. It is widely used in lithium battery current collector coating, flexible electronics, thin-film solar cells, semiconductor research, nanomaterials, barrier films, sensors, and advanced coating technology development.
Technical Parameters：
| Item | Specification |
| Model | KS-RPECVD-300 |
| Equipment Type | High Vacuum Roll-to-Roll PECVD System |
| Application | Thin film deposition of SiOx, SiNx, amorphous silicon, polycrystalline silicon, carbon-based materials, etc. |
| Heating Zone Size | 300 × 300 × 300 mm |
| Constant Temperature Zone | 150 × 150 × 150 mm |
| Maximum Temperature | 1100°C |
| Heating Rate | 10°C/min |
| Temperature Control Accuracy | ±1°C |
| Quartz Tube Size | Φ300 × 2200 mm |
| Quartz Tube Material | High Purity Quartz |
| RF Power Supply | 13.56 MHz Automatic Matching RF Generator |
| RF Output Power | 1000 W |
| Input Voltage (RF) | AC220V / 50Hz (±10%) |
| Operating Temperature | 0 ~ 50°C |
| Relative Humidity | 10% ~ 90% RH (Non-condensing) |
| MFC Power Supply | DC24V (Ripple ≤50mV) |
| Mixing Tank Size | Φ80 × 120 mm |
| Ultrasonic Atomizer | 1.7 MHz Ultrasonic Nebulizer |
| Vacuum Gauge | Compound Vacuum Gauge |
| Vacuum Measuring Range | 1.0E-5 Pa ~ 1.0E+5 Pa |
| Vacuum Display | LED Digital Display |
| Roll-to-Roll Speed | 1 ~ 400 mm/min Adjustable |
| Substrate Type | Copper Foil Roll-to-Roll Transport |
| Cooling Device | Integrated Cooling Section Between Winder and Tube Furnace |
| Mechanical Pump | Two-Stage Rotary Vane Pump |
| Pumping Speed | 4 L/s |
| Mechanical Pump Ultimate Pressure | ≤5E-1 Pa |
| Mechanical Pump Voltage | AC220V |
| Mechanical Pump Power | 0.4 kW |
| Diffusion Pump Model | K-100 |
| Diffusion Pumping Speed | 300 L/s |
| Diffusion Pump Ultimate Vacuum | 5.0E-5 Pa |
| Control System | PLC + Touch Screen Fully Automatic Control |
| Overall Dimensions | L3500 × W900 × H1600 mm |
| Equipment Weight | Approx. 900 kg |
| Rated Voltage | AC380V, 50Hz |
| Total Rated Power | Approx. 8.5 kW |
