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Crystal Growth Furnace

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4 arc pulling method single crystal growth furnace with 3000C temperature

KS-CGF-4CZ is a pulling method single crystal growth furnace using 4 electric arcs (arc gas arc is used to melt the sample, and the pulling device is pulled), and its temperature can reach 3000 ℃. 

This single crystal furnace is especially suitable for growing single crystal with high melting point, such as Ti single crystal, YSZ, SiC and CeRh2Si, etc.

Technical Parameters

Product Description:

KS-CGF-4CZ is a pulling method single crystal growth furnace using 4 electric arcs (arc gas arc is used to melt the sample, and the pulling device is pulled), and its temperature can reach 3000 ℃. The cavity is 304 stainless steel cavity (with water-cooled interlayer), and the vacuum degree can reach 10-5Torr. This single crystal furnace is especially suitable for growing single crystal with high melting point, such as Ti single crystal, YSZ, SiC and CeRh2Si, etc.

Technical Parameters:

Product modelKS-GCF-4CZ crystal   growth furnace
Chamber sizeΦ257*360mm
Arc starting   power18 V / 185 A   Voltage 380V
Melting   temperatureup to 3000℃
Pulling speed0.2-10mm/h
Lifting stroke0-70mm
Rotating speed40RPM
Vacuum pumpThe equipment   is equipped with a molecular pump system (mechanical pump + vortex molecular   pump)
Circulating   water chillerWater flow rate   with 58L/min